Operation parameters of magnetron diode for high-rate deposition of aluminum films
Электронный архив ТПУ
Информация об архиве | Просмотр оригинала| Поле | Значение | |
| Заглавие |
Operation parameters of magnetron diode for high-rate deposition of aluminum films
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| Автор |
Sidelev, Dmitry Vladimirovich
Grudinin, Vladislav Alekseevich |
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| Тематика |
магнетронный разряд
плазма осаждение алюминиевые пленки |
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| Описание |
This article reports on the results of the detailed study of erosion of Al target in magnetron discharge plasma. It was demonstrated that the combination of middle-frequency (MF) and high impulse power (HiPIMS) power supply results in the significant increase of deposition rates of Al films by changing of sputtering yield. The MF pulse assists HiPIMS discharge to transit in a high power mode.
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| Дата |
2020-01-20T09:42:33Z
2020-01-20T09:42:33Z 2018 |
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| Тип |
Conference Paper
Published version (info:eu-repo/semantics/publishedVersion) Conference paper (info:eu-repo/semantics/conferencePaper) |
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| Идентификатор |
Sidelev D. V. Operation parameters of magnetron diode for high-rate deposition of aluminum films / D. V. Sidelev, V. A. Grudinin // Journal of Physics: Conference Series. — 2018. — Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects"14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM) : [proceedings], 16-22 September 2018, Tomsk, Russian Federation. — [032020, 5 p.].
http://earchive.tpu.ru/handle/11683/57378 10.1088/1742-6596/1115/3/032020 |
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| Язык |
en
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| Права |
Open access (info:eu-repo/semantics/openAccess)
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| Издатель |
IOP Publishing
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